Abstract
We conceived that TiO2 photocatalyst was applied to the patterning material. We developed liquid organic-inorganic composite materials of TiO2 and FluoroAlkylSilane, and made layer by coating this liquid on the substrate. This layer has low wettability for ink, but if ultraviolet rays was exposed this layer, the change of wettability is caused by redox reaction of TiO2 photocatalyst, this layer becomes to have high wettability for ink. Because hydroxy radical and super-oxide anion are generated by a redox action of TiO2 photocatalyst, and they decompose the FluoroAlkyl-chain on the layer. Instead of the FluoroAlkyl-chain, the Hydroxyl appears on the layer. If ultraviolet rays is exposed on this layer through the photomask, it is possible to make pattern featuring high and low wettability for ink on this layer. Moreover, we developed the method which manufactured the color filter from the combination this pattern formation technology with the ink jet technology.
