Abstract
Novel micro-patterning technique based on photolithography using photocatalytic activity mask with the capability of oxidized decomposition of organic substances was studied. Ultraviolet(UV) light was irradiated to an organic film on a substance through a TiO2-coated photomask under contact and proximity (gap ≤ 300 μm) conditions of the photomask to the organic film. A fluoride-containing oil-repellent film and an ultrathin polyelectrolyte complex film used in this study were prepared by spin coating and layer-by-layer adsorption technique, respectively. The surface of the former was converted from the oil-repellent state to the oil-philic state with 20 μm resolution due to photocatalytic decomposition of the surface layer of the film via UV irradiation(less than 1minute) through the mask. On the other hand, the latter one was etched effectively under an appropriate condition of the photocatalytic lithography.
