抄録
Two examples of spectroellipsometric (SE) analysis for surfaces and thin films are given. The first example is ZnO epitaxial layers deposited on C- and A-surfaces of sapphire substrates. The surface roughness layer in terms of Bruggeman effective medium approximation was inevitable to explain the measured ψ and Δ spectra. Thickness of the surface layer deposited on C-surface is larger than that on A-surface. SEM and AFM observations are made to check the data by optical measurements. The second example is a simultaneous evaluation of the surface adsorption layer thickness and the Si substrate temperature. Influence of statistical deviation of the initial values in the multiparameter analysis is demonstrated. XPS observation is made to check the optical measurements and the advantage of SE comparing with XPS is described.
