表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
高エネルギーイオン散乱法(HEIS)とその応用
成沢 忠
著者情報
ジャーナル フリー

1983 年 4 巻 3 号 p. 157-164

詳細
抄録

This article reviews the principle, techniques, and applications of high energy ion scattering (HEIS) to surface physics. Particular emphasis is given to computer simulation of the nuclear encounter process between high energy (∼MeV) He ions and target surface atoms. This simulation is mandatory for deriving any quantitative conclusions from experimental measurements. At the same time, it is most useful to comprehend the nature of HEIS and how to use it. Also discussed are possible applications of HEIS to compound semiconductor problems, some of which are under consideration in our Optoelectronics Joint Research Laboratory.

著者関連情報
© 社団法人 日本表面科学会
前の記事 次の記事
feedback
Top