抄録
The removal of arsenic(III) and arsenic(V) from water solution was carried out using a chelating resin, Diaion CRB02 (Mitsubishi Chem., Japan). As(III) and As(V) were removed at the pH range of 6-10 using the resin. At the optimum pH of 7, the average quantities of adsorbed arsenic on the resin determined by an analysis of adsorption isotherms were 15.5 mg·g-1 for As(III) and 4.9 mg·g-1 for As(V). When the sample solution {As(III) and As(V): 50.0 mg·l-1} passed through the column at a space velocity of 40 h-1, the breakthrough points of arsenic appeared was at 110 fold the resin volume for As(III) and 40 fold the resin volume for As(V). Adsorbed arsenic was recovered at 89∼103% for As(III) and 94∼96% for As(V) using 0.1 M and 1 M sodium hydroxide solutions. The results suggest that AS(III) and As(V) in waste water can be successfully removed using the resin and recovered using 0.1 M and 1 M sodium hydroxide solutions.
