抄録
This paper describes an ellipsometric method for separate measurements of refractive index and thickness of a transparent film at an arbitrary angle of incidence, and its application to the autocollimation type ellipsometer, which enables monitoring of film growth through a single window of a vacuum chamber. The growth process of a Corning 7059 glass films generated by rf sputtering and the thickness distribution of the sputtered glass films are observed by this method. A simple method for widening uniform thickness area in the sputtered films by the use of an annular magnet is also described.
