抄録
To fabricate highly reflective X-ray mirrors coated with metal films, we have developed a deposition system equipped with an electron cyclotron resonance (ECR) ion source to irradiate a substrate with low-energy ions as well as to sputter the metal target. The ECR ion source has been designed to avoid depositing a metal film onto a microwave-introducing window. This design has enabled us to stably deposit metal films, suggesting wide-area X-ray mirrors. A platinum film with a surface roughness of 0.3 nm has been deposited by means of this equipment, which should ensure high-reflectivity X-ray mirrors.
