Generation of Extremely High Vacuum with a New Sputter Ion Pump

Hiroyuki KINPARA; Kazutoshi HIRASAWA; Tsuyoshi KOTANI; Masaaki NISHIYAMA; Koichi HUJINO; Katsuji NAKAJIMA; Nozomu TAKAGI; Hiroyuki YAMAKAWA; Guo HAU SHEN

doi:10.3131/jvsj.37.732

Hiroyuki KINPARA, Kazutoshi HIRASAWA, Tsuyoshi KOTANI, Masaaki NISHIYAMA, Koichi HUJINO, Katsuji NAKAJIMA, Nozomu TAKAGI, Hiroyuki YAMAKAWA, Guo HAU SHEN

著者情報

ジャーナルフリー

1994 年 37 巻 9 号 p. 732-735

DOI https://doi.org/10.3131/jvsj.37.732

詳細

抄録

We have developed a sputter ion pump (SIP) to obtain a lower ultimate pressure.The pressure of a test chamber was reduced to 6.8×10^-10 Pa by the SIP after 250°C bakeout for 48 hours. The pump is able to start the discharge in 1.41.8 min after turning on the power supply at 1.61.9×10^-9 Pa, and in about 10 s at 14×10^-8Pa. The achievement of the extremely high-vacuum, XHV, and the easy discharge initiation indicate that the Penning discharge is still strongly maintained at the very low pressure.

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