抄録
Glancing-angle deposition method was successfully applied in three reactive plasma processes (reactive ion plating, reactive sputtering and reactive evaporation) in order to fabricate indium-nitride films with microvillus-like isolated nanocolumnar structures. We found that the shape controllability of the isolated nanocolumns could partly be ascribed to the preferred orientation of the crystalline nanocolumns. The microvillus-like structures made the electrochromic color change of the indium-nitride films much larger.
