Journal of the Vacuum Society of Japan
Online ISSN : 1882-4749
Print ISSN : 1882-2398
ISSN-L : 1882-2398
解説
パーフルオロ化合物(PFCs)等を含有するマイクロエレクトロニクス製造プロセスからの排出ガス分析技術
富田 修康伊崎 隆一郎
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ジャーナル フリー

2009 年 52 巻 7 号 p. 393-396

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抄録
  In the manufacturing processes of Semiconductor and the Liquid Crystal Display (LCD), Perfluorocompounds (PFCs), Sulfurhexafluoride (SF6) and Nitrogenfluoride (NF3), which have high Green house effect,are used in large quantities. As emission reduction of these gases, the following countermeasures are taken.
  1. Opimization of PFCs usage
  2. Utilization of alternative gas
  3. Instllation of Scrubber for exhaust gas treatment
  To inspect the effect of countermeasure that are introduced for these PFCs emission reduction, it is necessary to analyze PFCs in exhaust gas. In this report, we will discribe about analysis technique for exhaust gas including PFCs from microelectornics manufacturing processes.
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© 2009 一般社団法人日本真空学会
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