Journal of the Vacuum Society of Japan
Online ISSN : 1882-4749
Print ISSN : 1882-2398
ISSN-L : 1882-2398
解説
単結晶グラフェン基板の創製に向けた SiC 上エピタキシャル少数層グラフェンの層数解析
日比野 浩樹影島 博之永瀬 雅夫
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ジャーナル フリー

2010 年 53 巻 2 号 p. 101-108

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抄録
  We review our research toward single-crystal growth of epitaxial few-layer graphene (FLG) on SiC substrates, in which surface electron microscopy techniques have played essential roles. We have established a method for evaluating the number of graphene layers microscopically using low-energy electron microscopy. The number-of-layers dependence of the work function and C1s binding energy is determined using photoelectron emission microscopy. We use LEEM and thermionic electron emission microscopy to investigate the growth processes of epitaxial FLG. Uniform bilayer graphene a few micrometers in size is obtained by annealing in UHV.
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© 2010 一般社団法人日本真空学会
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