Journal of the Vacuum Society of Japan
Online ISSN : 1882-4749
Print ISSN : 1882-2398
ISSN-L : 1882-2398
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マグネトロンスパッタ法による金属膜の膜厚分布
酒谷 淳寛山崎 登志成喜久田 寿郎吉澤 壽夫平手 博木田 隆之
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2011 年 54 巻 3 号 p. 184-187

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  Various metal films were deposited by magnetron sputtering, and their thickness distributions were measured. The distributions are considered to depend on the angular distribution of the atoms ejected from a target. Some metals showed a thickness distribution with its maximum at the anode center while the others showed a thickness distribution with its maximum at a position slightly inside the target erosion. According to a theory and computer simulation, as the binding energy (i.e. cohesive energy) of a target decreases and the mass of the target atoms increases, the atoms tend to be ejected normally with their angular distribution being apt to be over-cosine. Thus, the thickness distributions were discussed in relation to the binding energy of the metals and the mass of the target atoms. The thickness distributions were also investigated for different discharge voltages.

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© 2011 一般社団法人日本真空学会
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