Journal of the Vacuum Society of Japan
Online ISSN : 1882-4749
Print ISSN : 1882-2398
ISSN-L : 1882-2398
製品紹介
中重負荷向けドライ真空ポンプの省エネルギー化
杉浦 哲郎
著者情報
ジャーナル フリー

2015 年 58 巻 7 号 p. 245-248

詳細
抄録

  For dry vacuum pumps, typically used for chemical vapor deposition (CVD) and Etching process in semiconductor factory, the durability of byproduct deposition and /or corrosion is very important. And also energy saving is one of the key factor on this application for cost ownership stand point.
  Our ``Model EV-M'' dry pumps have achieved significant enhancement for saving energy consumption, and have incorporated various countermeasures against byproduct deposition and corrosion, like optimized internal temperature profile and material selection. With these, both significant saving energy and process durability can be achieved under the use of the harsh duty condition such as CVD and Etching process.
(Note: EV-M is Ebara's model code)

著者関連情報
© 2015 一般社団法人日本真空学会
前の記事 次の記事
feedback
Top