Journal of the Vacuum Society of Japan
Online ISSN : 1882-4749
Print ISSN : 1882-2398
解説
反応性大電力パルススパッタリング(R-HiPIMS)における遷移領域制御技術
清水 徹英ミシェル ビラマヨアジュリアン ケラウディダニエル ルンディンウルフ ヘルマーソン
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2017 年 60 巻 9 号 p. 346-351

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抄録

 This is to review a novel approach stabilizing reactive mode at transition regime in reactive high-power impulse magnetron sputtering (R-HiPIMS). The proposed method is based on a real-time monitoring of peak discharge current. To stabilize the process conditions at a given set point, a feedback control system, which automatically regulates the pulse frequency, and thereby the average sputtering power, was implemented to maintain a constant maximum discharge current. As a representative result, the variation of the pulse current waveforms over a wide range of reactive gas flows and pulse frequencies during a R-HiPIMS of Hf in an Ar-N2 atmosphere illustrates that the discharge current waveform is an excellent indicator of the process conditions. Applicability of the proposed method was successfully demonstrated.

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© 2017 一般社団法人日本真空学会
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