日本機械学会論文集 B編
Online ISSN : 1884-8346
Print ISSN : 0387-5016
Si3N4アブレーション層を通過するふく射エネルギ移動
白井 紘行桐山 昭夫
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1985 年 51 巻 463 号 p. 1054-1060

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The equilibrium compositions, special absorption coefficient, emittance and transmittance of Si3N4 ablation layer plasmas have been calculated for temperatures of 3000K and 5000K, thickness of 0.01, 0.1 and pressures of 0.1, 1 and 10 atmospheres. Calculations of radiation include molecular bands, atomic lines, and continuum processes. The emittance and transmittance results are applied to a simple shock layer model to predict the effectiveness of the Si3N4, ablation layers for a blockage of the high-temperature stagnation shock layer radiation. The results show that the photoionization process in Si atom is most effective in blocking the radiation and the Si3N4 ablation layers are very effective in reducing the radiative heating to a vehicle.

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