垂直円板が置かれた円管内の低レイノルズ数流れ

抄録

A rough estimate of flow physical properties in a chemical vapour deposition system has shown that Reynolds numbers in the circular tube reactor of the system are changed from the order of 10^-1 up to 10², and Knudsen numbers from the order of 10^-2 down to 0.0. Finite-difference solutions with viscous and slip flow boundary conditions of the equations of motion for an incompressible flow over a disk in the tube have been obtained for a range of Reynolds numbers from R_e=5 to R_e=10². The vortex lengths behind the disk are found to increase with the Reynolds numbers and the radius ratios of the disk and the tube. By rarefied gas effects, the vortex in a slip flow regime is smaller than that in a viscous flow. The results of liquid flow visualization using an aluminium dust method are in accord with the finite-difference solutions with a non-slip boundary condition.