Micro- and Nanofabrications with Polymer Resists and Their Evaluations

Abstract

Micro- and nanofabrication with polymer resists, and evaluation of resist patterns with scanning electron microscopes (SEM) and atomic force microscopes (AFM) are described. Minimum feature sizes of semiconductor integrated circuits have reached the scale comparable to the molecular sizes of base matrix polymers. It is challenging just to observe such small patterns. Here, we show some examples and discuss issues of future application.