抄録
Photoelectron spectroscopy gives information on electronic states of materials which control properties of materials and devices. Developments of EUV optics and high brilliant pulsed EUV sources in these days have enabled us to develop a new photoelectron spectroscopy, EUPS. With EUPS, we can achieve sub-μm spatial resolution, which is more than one order of magnitude better than that of a commercial XPS. EUPS can observe one mono-layer surface, and ultra-fast phenomena. In this article, after explaining the principle of EUPS, experimental results on observation of chemical shifts, detection of ultra-low level contamination, observation of laser ablation are described. Studies for improving spatial resolution and energy resolution of EUPS are also described.
