抄録
Mass production EUV market is delayed 3 years, because of delay of high power EUV light source.
Therefore DUV is still used in leading edge of mass production line in semiconductor industry.
Requirement for DUV source is higher power, precise spectral control and ECO friendly hardware.
Gigaphoton released, 120 W product GT64A with Focus drilling technology into the market. On the
other hand bottle neck of EUV lithography is still power of EUV light source. In the fi eld the EUV
source achieved only 10W level operation. Gigaphoton is developing Proto-2nd phase machine to
demonstrate key technologies. Droplet generator is improved dramatically, stable operation >100 h is
demonstrated. CO2 laser achieved 9.0 kW operation with 75% duty. EUV light emission 5 W @I/F(at
Intermediate Forcus) Clean power during 2 hours is demonstrated very recently. Target of proto-2 is
50 W level one week operation demonstration by Q4 2013. Base technologies for HVM are under
development in parallel. High CE technology, we found around 5% CE average with picosecond prepulse.
Also demonstrated remarkable reduction of mist after the picosecond pre-pulse. New 25 kW CO2
laser amplifier development project is on going co-operation with Mitsubishi electric. Our target of
“Real pilot” shipment is 2015.
