抄録
A new vacuum ultraviolet (vuv) fluorine (F2) lamp excited by continuous-wave microwave discharge was developed and its performance characteristics were investigated. The fluorescent spectrum of the emitted light has its peaks at 157nm, the same as that of a conventional F2 laser, and at 166nm. The vuv fluorescent power was 18.9W, which was obtained with an intrinsic efficiency of 6.2% with a 310W micro-wave power deposition. The lamp was successfully applied to the vuv photo-chemical etching of a thermally oxidized silicon film.
