Study of contamination on copper surface with abrasive materials by low energy secondary ion mass spectrometry.

Abstract

A low energy secondary ion mass spectrometer was constructed. An argon ion gun was designed by the authors and a modefied quadrupole type mass analyser was used as a detector. The best operating condition was established as follows: ion accelerating voltage; 500V, argon pressure;5×16mm. Surface contamination on copper surface with abrasive materials were investigated for chemical etching with hydrochloric acid Al2O3powder emulsion polishing, Al2O3abrasing paper polishing and SiC abrasing paper polishing. The latter two methods gave very strong peak of27Al. The best result for positive ions was obtained with samples treated by chemical etching with hydrochloric acid.