MATERIALS TRANSACTIONS
Online ISSN : 1347-5320
Print ISSN : 1345-9678
ISSN-L : 1345-9678
Study on Fabrication of Titanium Oxide Films by Oxygen Pressure Controlled Pulsed Laser Deposition
Takahiro NakamuraEiichiro MatsubaraNobuaki SatoAtsushi MuramatsuHideyuki Takahashi
Author information
JOURNALS FREE ACCESS

2004 Volume 45 Issue 7 Pages 2068-2072

Details
Abstract

Titanium oxide films were formed using a titanium target by a pulsed laser deposition (PLD) technique under different oxygen pressures from 10−6 to 100 Pa. Their densities and thickness were evaluated from total external X-ray reflection profiles and their atomic structures were determined by grazing incidence X-ray scattering (GIXS), and their surface morphology was observed by atomic force microscopy (AFM). The atomic structures of the films were gradually changed from metal titanium through TiO to Rutile-type titanium dioxide TiO2. The film surfaces became rough above 13.3 Pa oxygen pressure during deposition. Their UV transmission spectroscopy was also observed to predict their photocatalytic activities.

Information related to the author
© 2004 The Japan Institute of Metals and Materials
Previous article Next article
feedback
Top