MATERIALS TRANSACTIONS
Online ISSN : 1347-5320
Print ISSN : 1345-9678
Effect of Pulsed Electrical Field on Deposition of YSZ Thin Films in an Aqueous Solution
Atsushi SaikiTakashi HashizumeKiyoshi Terayama
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2010 Volume 51 Issue 2 Pages 297-300

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Abstract

In this study we investigated YSZ thin film deposition from an aqueous solution by applying constant electrical field and the effect of a pulsed electrical field upon the growth condition of films. The precursor was an aqueous solution of Zr(NO2)3-2H2O, Y(NO3)3-6H2O, and 0.5 vol% NH3(aq). The thin film was deposited on the minus electrode side of the glass substrate, which was placed above the minus electrode with a gap distance of 48–530 μm. By applying the electrical field, the thin film was effectively deposited on glass substrates under an applied voltage of 2.5 V for 300 s at room temperature. The as-deposited film was amorphous, and a crystalline phase with a transparent and smooth surface can be obtained after annealing at 773 K for 3 h in air. When a pulse bias is applied to the electrical field, the film thickness, surface defects, and roughness were changed with the frequency. At 2 Hz, the film was fabricated effectively, and a thick film was obtained, but films with smoother and fewer defect surfaces were obtained in a range of about 10–100 Hz.

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© 2010 The Japan Institute of Metals and Materials
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