抄録
Silica based membranes were successfully prepared by using a counter diffusion chemical vapor deposition method. The key point to control membrane properties is a silica source which the organic groups connected to Si by the Si–C bond. Ethyltrimethoxysilane (ETMOS), Propyltrimethoxysilane (PrTMOS), Phenyltrimethoxysilane (PhTMOS), Diphenyldimethoxysilane (DPhDMOS) and Hexyltrimethoxysilane (HTMOS) are employed as silica precursors. C3H6/C3H8 permeance ratio was 414 (C3H6 permeance 1.0 × 10–8 mol m–2 s–1 Pa–1) through the membrane prepared by using HTMOS. CH4/C2H6 permeance ratio was 37 (CH4 permeance 2.8 × 10–9 mol m–2 s–1 Pa–1) through the membrane prepared by using ETMOS. C6H6/C6H12 separation factor was 60 with the total flux of 5.6 × 10–3 kg m–2 h–1 through the membrane prepared by using DPhDMOS.
