Abstract
Photosensitive polyimide coatings are being used as interdielectrics and protection coatings of electronic devices. They can easily give finely patterned films by photolithographic procedure with excellent characteristics of polyimides.
Photosensitive polyimides are polyimides or polyimide precursors with photosensitive groups and can be converted to polyimides by heat curing. Photosensitive groups like double bonds or azides are incorporated to polymer chain through covalent bonds or acid-amine salts. Some polyimides have photosensitivity even without photosensitive groups.
They are used as interdielectrics or protection coatings of semiconductor devices, LSI assembly packages or other electronic devices such as linephotosensors.
In this paper, photosensitive polyimides, their characteristics, pattern generation processes and applications are reviewed.
