電子写真製版法 (第2報) 中間層法について

抄録

In this report, we studied the characteristics and the practical availability of the Interim Electrofax photoengraving process. The plate for the Interim process was consisted of the double Sensitive layers. We prepared the plate by coating the Mg plate with PVA-(NH₄)₂Cr₂O₇ soln. in 1-2μ dry thickness as the under layer and Electrofax (ZnO-resin dispersed system) soln. in 9-10μ dry thickness as the top layer.
The following results were obtained.
(1) The value of Cmax, C₅, LT (dark decay time from Cmax to 100V), τ* (light decay time from 100V to 5V) of the interim layer were increased than ZnO monolayer.
(2) 1st exposure value of the interim layer was 167lax·sec under tungsten lamp of 10-150lux, and the value of ZnO monolayer was 145lux·sec.
(3) The resolving power of the etching plate was 20-30line/mm according to ZnO top layer thickness.
(4) 2nd exposure time to the PVA under was 19-30sec in mean value under 80, 000lux arc lamp intensity.
(5) The processing time was 16.5min. including Dow etching time, and this process was N→P system.
Comparing to the Direct process, we confirmed that the Direct process was better than the Interim process in the plocessing time, prate life, resolution and the etching plate qualities.