電子ビームリソグラフィ装置
1980 年 49 巻 1 号 p. 70-77
詳細
1980 年 49 巻 1 号 p. 70-77
Recent developments of electron beam lithography systems, chiefly electron beam delineators, are reviewed. After various types of the machines are classified, the explanations are made about principal elements of the machines, the control system, electron gun, electro-optical column and the sample stage putting emphasis on the factors which govern the accuracy of the fine patterns. The drawing time, one of the key factors for practical use, is analyzed and the compromization between speed and accuracy is discussed introducing the authors' estimation about the optimization of variable shaped beams as an example. The experimental efforts of drawing ultimately fine lines by electron beams are also described.
