Thermal shock resistance of yttria stabilized zirconia film prepared by MOCVD

Rong Tu; Teiichi Kimura; Takashi Goto

doi:10.14853/pcersj.2002F.0.432.0

15th Fall Meeting of The Ceramic Society of Japan

DOI https://doi.org/10.14853/pcersj.2002F.0.432.0

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Host: The Ceramic Society of Japan

Thermal shock resistance of yttria stabilized zirconia film prepared by MOCVD

Rong Tu, Teiichi Kimura, Takashi Goto

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Keywords: yttria stabilized zirconia, MOCVD, thermal barrier coating, thermal shock resistance, thermal cycling, Hastelloy-XR alloy

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Pages 432

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Abstract

Yttria stabilized zirconia (YSZ) films were prepared on Hastelloy-XR alloy substrates by MOCVD at a rate of 100μm h^-1. The effect of yttria content on the thermal shock resistance of YSZ films was investigated at 1273 to 1373 K in air. 4 mol% Y₂O₃-ZrO₂ film in a tetragonal structure showed excellent thermal shock resistance without spalling after 1200 thermal cycles at 1373 K.

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