抄録
Organically modified germanosilicate (ORMOGSIL) glasses with Ge contents of 10 and 20 mol% were fabricated by a sol-gel method. Germanium isopropoxide and Methacryloxypropyltrimethoxysilane (MPTMS) having photo-polymerizable methacrylic groups were used as starting precursors. A large photoinduced refractive index increase up to 0.016 was induced with ultraviolet illumination. The gradual decrease in thickness with UV exposure indicates that the refractive index change in ORMOGSIL glass is predominantly due to structural densification induced by UV exposure. In addition, the effect of Ge and photoinitiator concentration on the photosensitivity of ORMOGSIL glass was investigated using FT-IR spectroscopy and prism coupler. Direct surface relief inscriptions upon the ORMOGSIL glasses using its large volume change were performed with ultraviolet illumination through a silica photo mask.
