抄録
Photosensitive materials making permanent refractive index change or surface modulation following by optical exposure is exploited in the fabrication of waveguides, gratings and holograms by producing microstructures on surfaces in many micro-optic applications. The inorganic-organic hybrid materials (HYBRIMER) in which the photosensitivity mechanisms in both of inorganic and organic materials can be applied can create high photosensitivity producing large light induced refractive index change accompanying with formation of surface microstructure. It will give the simpler technique of direct photo-patterning to fabricate the microstructured surfaces, which excludes the developing process. Recently, we reported various types of high photosensitive HYBRIMERs using different photosensitivity mechanisms of inorganic and organic groups in the HYBRIMER. Both changes of the refractive index and the volume increase or decrease upon UV illumination depending on the photosensitive mechanism of different composition. The microstructred surfaces were directly imprinted on the surface using a photomask, a phasemask, and an interferometer.
