抄録
TiNx films were prepared by laser chemical vapor deposition (LCVD) with tetrakis (diethylamido) titanium (TDEAT) and ammonia as source materials. The effects of laser power, total pressure in a chamber, pre-heating temperature and flowing rate ratio of Ar to NH3 on the composition, microstructure and deposition rate of TiNx films were investigated. TiNx films in a single phase with faceted texture and columnar cross section were obtained. The orientation of (111) increased with decreasing laser power, total pressure. The compositional ratios of N and Ti were in the range of 0.91-0.98 at deposition temperature of 700-1020 K. The deposition rate of TiN films decreased with increasing of total pressure and laser power, showing a maximum deposition rate of 90 μm/h at PL = 100 W, Ptot = 400 Pa and Tdep = 870 K.
