抄録
A novolak resist with naphthoquinone diazide is available to produce a coil insulating layer for a GMR head by heat-curing process. The relationship between the molecular structures of several properties, i.e., internal stress, thermal expansion, and desorption of gases from the insulating layer is studied. The effects of the atmospheres of N2, O2, and air on the properties of the insulating film upon heat-curing are also examined. The prepared novolak resist is analyzed the measurements of TGA, DSC, IR, GPC, UV, internal stress, thermal expansion, and Thermal Desorption Spectroscopy (TDS). The mechanism for hardening of the novolak resist is also discussed.
