Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Resist-Pattern Guided Self-assembly of Symmetric Diblock Copolymer
Toru Yamaguchi, Hiroshi Yamaguchi
Author information
Keywords: self-assembly, graphoepitaxy, block copolymer, AFM
JOURNAL FREE ACCESS

2006 Volume 19 Issue 3 Pages 385-388

Details
Download PDF (1874K)
Download citation RIS

(compatible with EndNote, Reference Manager, ProCite, RefWorks)

BIB TEX

(compatible with BibDesk, LaTeX)

Text
How to download citation
Contact us
Article 1st page
Content from these authors
© 2006 The Society of Photopolymer Science and Technology (SPST)
Previous article Next article
Favorites & Alerts

Recently viewed articles
Share this page
feedback
 Top