抄録
The Photopolymer Science and Technology Award No. 072100, the Best Paper Award 2007, was presented to Makiko Irie, Kotaro Endo, and Takeshi Iwai, all from Tokyo Ohka Kogyo Co., Ltd., for their outstanding contribution published in Journal of Photopolymer Science and Technology 19(4), 565-568 (2006), entitled "Surface Property Control for 193nm Immersion Resist".
