Status of High-Index Materials for Generation-Three 193nm Immersion Lithography

Paul A. Zimmerman; Chris van Peski; Bryan Rice; Jeff Byers; Nicholas J. Turro; Xuegong Lei; Juan Lopez Gejo; Vladmir Liberman; Steve Palmacci; Mordy Rothchild; Andrew Whitker; Idriss Blakey; Lan Chen; Bronwin Dargaville; Heping Liu

doi:10.2494/photopolymer.20.643

Paul A. Zimmerman, Chris van Peski, Bryan Rice, Jeff Byers, Nicholas J. Turro, Xuegong Lei, Juan Lopez Gejo, Vladmir Liberman, Steve Palmacci, Mordy Rothchild, Andrew Whitker, Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu

Author information

Paul A. Zimmerman
SEMATECH
Chris van Peski
SEMATECH
Bryan Rice
SEMATECH
Jeff Byers
SEMATECH
Nicholas J. Turro
Columbia University
Xuegong Lei
Columbia University
Juan Lopez Gejo
Columbia University
Vladmir Liberman
MIT-LL
Steve Palmacci
MIT-LL
Mordy Rothchild
MIT-LL
Andrew Whitker
University of Queensland
Idriss Blakey
University of Queensland
Lan Chen
University of Queensland
Bronwin Dargaville
University of Queensland
Heping Liu
University of Queensland

Keywords: Immersion lithograph, refractive index, resist, lens, fluid

JOURNAL FREE ACCESS

2007 Volume 20 Issue 5 Pages 643-650

DOI https://doi.org/10.2494/photopolymer.20.643

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Abstract

Generation-three (Gen-3) immersion lithography can be an enabler for the 32nm half-pitch node. For Gen-3 lithography to be successful, however, there must be three major breakthroughs in materials development: high refractive index ("high-index") lenses, high-index immersion fluids, and high-index photo-resists. Currently a material for a high-index lens element, lutetium aluminum garnet (LuAG), has been identified. However, suitable materials choices remain elusive for both the Gen-3 fluid and resist. This paper reviews the successes and failures in the search for Gen-3 high-index materials.

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