Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Status of High-Index Materials for Generation-Three 193nm Immersion Lithography
Paul A. ZimmermanChris van PeskiBryan RiceJeff ByersNicholas J. TurroXuegong LeiJuan Lopez GejoVladmir LibermanSteve PalmacciMordy RothchildAndrew WhitkerIdriss BlakeyLan ChenBronwin DargavilleHeping Liu
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2007 年 20 巻 5 号 p. 643-650

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Generation-three (Gen-3) immersion lithography can be an enabler for the 32nm half-pitch node. For Gen-3 lithography to be successful, however, there must be three major breakthroughs in materials development: high refractive index ("high-index") lenses, high-index immersion fluids, and high-index photo-resists. Currently a material for a high-index lens element, lutetium aluminum garnet (LuAG), has been identified. However, suitable materials choices remain elusive for both the Gen-3 fluid and resist. This paper reviews the successes and failures in the search for Gen-3 high-index materials.
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© 2007 The Society of Photopolymer Science and Technology (SPST)
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