Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Organic Field-Effect Transistors with High-κ HfO2/ Resin Double Gate Insulator
Gou MasakiShigeki NakaHiroyuki Okada
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2008 Volume 21 Issue 2 Pages 189-192

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Abstract
High-κ insulator with a higher driving capability is promising for an organic field-effect transistor (OFET). First, insulating material of solution-processed TiO2 was tested for pentacene-based organic transistor. Second, HfO2, which is commonly used for Si FET, was also selected and the organic transistor with stacked Hf2/ organic resin was fabricated. Field-effect mobility of 0.32 cm2/Vs was obtained for the top-contact type OFET with stacked HfO2-based insulator.
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© 2008 The Society of Photopolymer Science and Technology (SPST)
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