抄録
The platform of ArF resin has been developing for several generations. ArF resin of each generation had to improve their character for the satisfaction of lithographic performance. Nowadays, we need the characters of good transmittance, resolution, relatively high etch resistance, Low line width roughness(LWR), in some cases, good resist reflow process (RFP). To solve these needs, we tried to approach in the view of morphology and physical properties of ArF resin. First of all, we performed polymer modeling with simulation, and also carried out actual synthesis. It was concluded that we did make a comparison between result of simulation and actual synthesis.
