Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Degradation of Hydrocarbon Fluids in the Immersion Lithography at 193 nm
Naphtali A. O'ConnorVladimir LibermanXuegong LeiJuan López-GejoNicholas J. TurroPaul A. Zimmerman
Author information
JOURNAL FREE ACCESS

2008 Volume 21 Issue 5 Pages 607-611

Details
Abstract
The search for successful generation 3 immersion lithography fluids is focused on high refractive index fluids which are transparent to 193 nm light. This search has led to saturated hydrocarbons which have been shown potential in this field. This paper discusses our observations that many immersion fluid candidates (saturated hydrocarbons and acetonitrile) were observed to polymerize upon irradiation with 193 nm light.
Content from these authors
© 2008 The Society of Photopolymer Science and Technology (SPST)
Next article
feedback
Top