Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
The Photo-absorption Coefficient Measurement of EUV Resist
Yasuyuki FukushimaTakeo WatanabeTetuo HaradaHiroo Kinoshita
著者情報
ジャーナル フリー

2009 年 22 巻 1 号 p. 85-88

詳細
抄録
We evaluated the transmittance and the sensitivity of the chemically amplified (CA) resist including various kind of photo acid generator (PAG) to clarify cause-and-effect relationship between the photo-absorption of PAG and the sensitivity under extreme ultraviolet (EUV) exposure. Transmission measurements and sensitivity measurements were carried out at the BL10 and BL3 beamlines in NewSUBARU synchrotron radiation facility. It is confirmed that increasing the atomic absorption cross section of an anion of PAG is effective in improving the sensitivity of the CA resist in EUVL.
著者関連情報
© 2009 The Society of Photopolymer Science and Technology (SPST)
前の記事 次の記事
feedback
Top