Room-Temperature Nanoimprint using Liquid-Phase Hydrogen Silsesquioxane with PDMS mold

Yuji Kang; Makoto Okada; Ken-ichiro Nakamatsu; Yuichi Haruyama; Kazuhiro Kanda; Shinji Matsui

doi:10.2494/photopolymer.22.193

Yuji Kang, Makoto Okada, Ken-ichiro Nakamatsu, Yuichi Haruyama, Kazuhiro Kanda, Shinji Matsui

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Keywords: poly(dimethyl siloxane) (PDMS), hydrogen silsesquioxane (HSQ), Room-Temperature, nanoimprint, liquid-phase

JOURNAL FREE ACCESS

2009 Volume 22 Issue 2 Pages 193-194

DOI https://doi.org/10.2494/photopolymer.22.193

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Abstract

We have newly developed an imprinting technique using liquid-phase hydrogen silsesquioxane (HSQ) with Poly(dimethyl siloxane) (PDMS) mold. The patterns with various linewidth were demonstrated by imprinting using liquid-phase HSQ. And then, after imprinting, the residual HSQ layer that remained in the compressed area was less than 10 nm thick, because the solvent in HSQ smoothly evaporated through the pores of PDMS mold.

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