20 nm Pitch Directed Block Copolymer Assembly Using Solvent Annealing for Bit Patterned Media

Journal of Photopolymer Science and Technology

Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244

20 nm Pitch Directed Block Copolymer Assembly Using Solvent Annealing for Bit Patterned Media

Joan K. Bosworth, Elizabeth Dobisz, Ricardo Ruiz

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Keywords: block copolymer, self assembly, solvent annealing, chemical epitaxy, directed self assembly

JOURNAL FREE ACCESS

2010 Volume 23 Issue 2 Pages 145-148

DOI https://doi.org/10.2494/photopolymer.23.145

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© 2010 The Society of Photopolymer Science and Technology (SPST)

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