Quick Formation of DSA Neutralization Polymer Layer Attached by Reactive Self-Assembled Monolayer

Abstract

The Neutralization layer for Directed self-assembly (DSA) was quickly formed by using polystyrene-polymethylmethacrylate random copolymer (PS-r-PMMA) immobilized by two different kinds of reactive self-assembled monolayers (SAMs). Two different kinds of reactive SAMs, one was photo-reactive and the other was thermal reactive, were covalently bound to PS-r-PMMA by the photo exposure or thermal annealing, respectively. The surface energy for the neutralization layer was easily controlled by the composition ratio of PS-r-PMMA. The lamellar-forming PS-PMMA block copolymer was perpendicularly aligned on the neutralization layers.