Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
5
Photo-triggered Surface Relief of Polystyrene Films- Highly Photo-sensitive Formation by the Addition of a Benzophenone Derivative
Takashi Ubukata, Shintaro Yamamoto, Yusuke Moriya, Shohei Fujii, Yasushi Yokoyama
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Keywords: surface relief, polystyrene, benzophenone, photosensitivity
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2012 Volume 25 Issue 5 Pages 675-678

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© 2012 The Society of Photopolymer Science and Technology (SPST)
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