Photocrosslinking of Blends of Multifunctional Diphenylfluorene Derivatives and Polysilanes Using Visible Light

Haruyuki Okamura; Kenji Funamoto; Akikazu Matsumoto; Keiko Minokami; Shinsuke Miyauchi

doi:10.2494/photopolymer.27.525

Haruyuki Okamura, Kenji Funamoto, Akikazu Matsumoto, Keiko Minokami, Shinsuke Miyauchi

Author information

Keywords: photocrosslinking, fluorene, epoxide, polysilane, photoacid generator, 405 nm light

JOURNAL FREE ACCESS

2014 Volume 27 Issue 4 Pages 525-528

DOI https://doi.org/10.2494/photopolymer.27.525

Details

Abstract

We have devised the photocrosslinked films of diphenylfluorene and polysilanes blends on irradiation at 405 nm. Photo-decomposition of Si-Si bonds of polysilanes was successfully suppressed during irradiation of the visible light. The photocrosslinking properties were strongly affected by PEB conditions and irradiation dose. The sensitivity of PMPS/BCAFG blended film was superior to that of hb-PPS/BCAFG blended one. The photocrosslinking was mainly due to the acid-catalyzed polymerization of the epoxy moieties of BCAFG. PMPS and hb-PPS moieties were incorporated with the film by the termination reaction of the polymerization with the terminal OH groups.

Corresponding author

Register with J-STAGE for free!