Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Spatial Point Analysis of Ion Track Patterns using Common Polymer Films by Atomic Forced Microscopy
Masaaki OmichiWookjin ChoiSatoshi TsukudaMasaki SugimotoShu Seki
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ジャーナル フリー

2014 年 27 巻 5 号 p. 561-564

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In the all fluence, the observed cumulative probabilities agree mostly with the theoretical cumulative probability. Random patterns, again, are reproducible to the distribution of ion tracks, and the charged ion particle rarely interferes with another charged ion particles at low fluence. This is the first report that nearest neighbor method was also applied to track pattern. This analysis will be contributed to not only fundamental study but also applied study such as cancer therapy.
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© 2014 The Society of Photopolymer Science and Technology (SPST)
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