Abstract
The directed self-assembly (DSA) of block copolymers (BCPs) can realize as one of candidates for next generation lithography. The BCPs for DSA should exhibit a high resolution, an ability to form perpendicularly oriented domains in the thin film by thermal annealing under mild condition, and a high etching selectivity. Here, we report a new Si-containing BCPs targeted to form perpendicularly oriented cylinders in thin films. The hydroxyl groups in the side chains introduced in the Si-containing block provide a good surface free energy (SFE) balance leading to the perpendicular orientation. Furthermore, this orientation can be completed in only one minute atmospheric thermal annealing at 150 oC. Oxygen plasma etching for the thin films results in the achievement of hexagonally packed cylinders.
