Precise Synthesis of Fluorine-containing Block Copolymers via RAFT

Ryuichi Nakatani; Hiroki Takano; Lei Wang; Alvin Chandra; Yuki Tanaka; Rina Maeda; Naoko Kihara; Shinya Minegishi; Ken Miyagi; Yusuke Kasahara; Hironobu Sato; Yuriko Seino; Tsukasa Azuma; Christopher K. Ober; Teruaki Hayakawa

doi:10.2494/photopolymer.29.705

Ryuichi Nakatani, Hiroki Takano, Lei Wang, Alvin Chandra, Yuki Tanaka, Rina Maeda, Naoko Kihara, Shinya Minegishi, Ken Miyagi, Yusuke Kasahara, Hironobu Sato, Yuriko Seino, Tsukasa Azuma, Christopher K. Ober, Teruaki Hayakawa

Author information

Ryuichi Nakatani
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Hiroki Takano
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Lei Wang
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Alvin Chandra
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Yuki Tanaka
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Rina Maeda
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
Naoko Kihara
DSA Research Department, EUVL Infrastructure Development Center, Inc.
Shinya Minegishi
DSA Research Department, EUVL Infrastructure Development Center, Inc.
Ken Miyagi
DSA Research Department, EUVL Infrastructure Development Center, Inc.
Yusuke Kasahara
DSA Research Department, EUVL Infrastructure Development Center, Inc.
Hironobu Sato
DSA Research Department, EUVL Infrastructure Development Center, Inc.
Yuriko Seino
DSA Research Department, EUVL Infrastructure Development Center, Inc.
Tsukasa Azuma
DSA Research Department, EUVL Infrastructure Development Center, Inc.
Christopher K. Ober
Department of Materials Science and Engineering, Cornell University
Teruaki Hayakawa
Department of Organic and Polymeric Materials, Tokyo Institute of Technology

Keywords: RAFT, fluorine, polyhedral oligomeric silsesquioxane, block copolymer, self-assembly, thin film

JOURNAL FREE ACCESS

2016 Volume 29 Issue 5 Pages 705-708

DOI https://doi.org/10.2494/photopolymer.29.705

Details

Abstract

Lamellar-forming PMAPOSS-b-PTFEMA block copolymers with unimodal GPC chromatograms were successfully synthesized by the polymerization of TFEMA in the presence of PMAPOSS as a macro-RAFT agent and AIBN as the initiator via RAFT. The SAXS, AFM and GISAXS data showed the lamellar domain was perpendicularly oriented to the Si-substrate after atmospheric thermal annealing. These experimental results also show that it is possible to precisely produce PMAPOSS-b-PTFEMA quantitatively, impervious to any side reactions. This technique is vital to meet the growing demands of the microelectronics industry for high throughput devices of ever-decreasing sizes.

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