Formation of Fine Pattern from Polyarylate-Silicone Copolymer by the Application of Reaction Development Patterning

Abstract

Multi-block copolymers between polyester (polyarylate) and polydimethylsiloxane were prepared by polycondensation using polydimethylsiloxane having p-hydroxyphenyl groups at its both chain ends as a diol monomer. The copolymer gave positive-tone fine pattern by the reaction development patterning with developer containing ethanolamine as a nucleophile. The silicone unit hybridized with polyarylate enabled pattern formation from dry film by contributing not only to high photosensitivity but also to high dissolution rate at the photo-irradiated area. Use of polyarylate instead of the copolymer resulted in unsuccessful pattern formation from dry film.