Study of Low Temperature Curable Polybenzoxazole Precursors Containing Aliphatic Dicarboxylic Acid Structures

Kenichi Iwashita

doi:10.2494/photopolymer.30.225

Journal of Photopolymer Science and Technology

Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244

Study of Low Temperature Curable Polybenzoxazole Precursors Containing Aliphatic Dicarboxylic Acid Structures

Kenichi Iwashita

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Keywords: Polybenzoxazole, Low temperature curing, Aliphatic dicarboxylic acid, Photosensitive insulation material

JOURNAL FREE ACCESS

2017 Volume 30 Issue 2 Pages 225-230

DOI https://doi.org/10.2494/photopolymer.30.225

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Abstract

As a demand for advanced packaging is growing, the photosensitive insulation material curable below 200 ^oC is required. We focused on photosensitive polybenzoxazoles derived from aliphatic dicarboxylic acids unit to reduce low cyclization temperature. We found that polybenzoxazole precursor having long methylene unit showed high cyclization percentage and elongation value at 200 ^oC of curing temperature.

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